描述
用于分析光源、透镜、反射镜、棱镜、光纤、衍射元件、MEMS 系统的光线追迹。Zemax® 基础、瞳面、非球面、非顺序追迹、像差、成像度量、优化/目标函数。应用：成像、照明、激光。折衷、机械约束、公差与成本。光学物理建模的光束传播。近场衍射与波导。
先修课程
- 先修条件：OSS 1003。
条件与方式
- 不另计学分：不另计学分 PLT 3004（不再开设）。
- 先修条件：OSS 1003。
- 每周讲座两小时，辅导/实验三小时。
原文参考文本
Optical ray-tracing for analysing systems of sources, lenses, mirrors, prisms, fibers, diffractive elements, MEMS. Zemax® fundamentals, pupils, aspherics, non-sequential tracing, aberrations, image metrics, optimization/merit functions. Applications: imaging, illumination, lasers. Trade-offs, mechanical constraints, tolerances and cost. Physical optics modeling of bean propagation. Near-field diffraction and waveguides.
- Prerequisite(s): OSS 1003 .
- Precludes additional credit for Precludes additional credit for PLT 3004 (no longer offered).
- Lectures two hours a week, tutorial/laboratory three hours a week.
来源与参考
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来源参考 : https://calendar.carleton.ca/undergrad/courses/OSS/